3 nanometer

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In [[semiconductor manufacturing]], '''3 nanometer''', usually abbreviated '''''3 nm''''', is the next [[semiconductor node]] shrink after the [[5 nanometer]] node. As of 2019 [[Samsung]] and [[TSMC]] have announced plans to put a 3nm node into commercial production.

==History==
In late 2016 announced plans to construct a 5nm to 3nm node [[semiconductor fabrication plant]] with a co-comitent investment of ~$15.7 US, with a tentative production date of 2022.<ref>Liquid error: wrong number of arguments (1 for 2)</ref> In 2017 [[TSMC]] announced it was to begin construction of a 3nm [[semiconductor fabrication plant]] at the [[Tainan Science Park]] in Taiwan.<ref>Liquid error: wrong number of arguments (1 for 2)</ref>

In early 2019 [[Samsung]] presented plans to manufacture 3nm [[GAAFET]] (Gate All-Around field effect transistors) at the 3nm node by 2021.<ref>Liquid error: wrong number of arguments (1 for 2)</ref> Samsung's semiconduction roadmap also included products at 8, 7, 6, 5, and 4 nm 'nodes'.<ref>Liquid error: wrong number of arguments (1 for 2)</ref>

==After 3nm==
The [[International Technology Roadmap for Semiconductors|ITRS]] uses (2017) the terms "2.1nm", "1.5nm", and "1.0nm" as generic terms for the nodes after 3nm.<ref></ref><ref></ref> "2 nanometer" (2nm) and "14 Angstrom" (14Å) nodes have also been (2017) tentatively identified by [[An Steegen]] (of [[IMEC]]) as future production nodes after 3nm, with hypothesized introduction dates of ~2024, and beyond 2025 respectively.<ref>Liquid error: wrong number of arguments (1 for 2)</ref>

In late 2018 YSMC chairman [[Mark Lui]] predicted chip scaling would continue to 3nm and 2nm nodes;<ref>Liquid error: wrong number of arguments (1 for 2)</ref> however, as of 2019 other semiconductor specialists were undecided as to whether nodes beyond 3nm could become viable.<ref>Liquid error: wrong number of arguments (1 for 2)</ref>

==References==


==Further reading==
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==External links==


[[Category:Lithography (microfabrication)]]
[[Category:Semiconductor device fabrication]]
[[Category:International Technology Roadmap for Semiconductors lithography nodes|*]]

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